Precise Fermi-level engineering in a topological Weyl semimetal via fast ion implantation
Published in Applied Physics Reviews, 2024
Precise control of Fermi level in topological Weyl semimetals through fast ion implantation techniques.
Recommended citation: Mandal, M., Chotrattanapituk, A., Woller, K., Xu, H., Mao, N., Okabe, R., Boonkird, A., Nguyen, T., Drucker, N.C., Momiki, T., Li, J., Kong, J., & Li, M. (2024). Precise Fermi-level engineering in a topological Weyl semimetal via fast ion implantation. Applied Physics Reviews 11, 021429.
Download Paper